Thin Film | 99.6% Al2O3 | NiCr/Au | .025″




Material: 99.6% Aluminum Oxide (Al2O3)
Size: 2.0″ x 2.0″ x .025″
Finish: As-Fired


Aluminum Oxide (Al2O3)

Aluminum Oxide is the standard microelectronic ceramic substrate material for the vast majority of applications.  Although it has low thermal conductivity – it has excellent mechanical and electrical properties and is used in DC for High-Frequency applications. Aluminum Oxide (Al2O3) is available in standard 96% grade for low cost and general electronics, and 99.6% for higher frequency applications. Aluminum Oxide is the first and only choice for many designers.


Benefits of Aluminum Oxide

  • High Mechanical Strength
  • Low Thermal Conductivity
  • Good Dielectric properties
  • Excellent high-temperature characteristics
  • Excellent metalizing properties for Thick Film, and DBCu
  • Excellent insulation
  • Good corrosion and wear resistance
  • Available in As-Fired, Lapped, and Polished ceramic substrates

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